| SUBJECT： |
International Conference of Photopolymer Science and Technology (ICPST-30) |
| DATE： |
2013-06-25 |
| LOCATION： |
Chiba, Japan, Asia |
| CONTENT： |
Official Information:
The conference covers a wide range of topics relevant to photopolymer science and technology in the following fields:
Next Generation Lithography (Directed Self Assembly DSA) and Nanotechnology
Advanced Materials for Molecular Device and Technology: Materials for Photoelectric Conversion
193 nm Lithography and Immersion Lithography/ Double Patterning
EB Lithography
Nanoimprint Lithography
EUV Lithography
Chemistry for Advanced Photopolymer Science
Photofunctional Materials for Electronic Devices: Materials for Photoelectric Conversion
General Scopes of Photopolymer Science and Technology
Panel Symposium "Application of Direct Self Assembly Materials" |
| Original file： |
No File
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| Promulgator Detail |
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| E-mail: |
reply |
| Address: |
Chiba, Japan, Asia |
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